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EUV Litho Still a Work in Progress

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mcgrathdylan
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Encouraging progress?
mcgrathdylan   7/12/2013 3:50:33 PM
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This seems like an old story, I know. The development of EUV lithography has been painfully slow. But it does seem like they are getting there, slowly but surely. The industry is really depending on EUV.

any1
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No, there's not much new with EUV litho
any1   7/12/2013 6:07:07 PM
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Yes, the technical side of EUV lithography seems to be making slow but steady progress.  However, the cost side of EUV litho will take much longer.  Eventhough it might become less expensive than quadruple patterning using immersion 193 nm lithography, it will still be prohibitively expensive for most applications for several more years.  

mcgrathdylan
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Re: No, there's not much new with EUV litho
mcgrathdylan   7/12/2013 6:31:35 PM
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It's probably going to be a while. I should have mentioned in this posting, too, that the power source is the big issue, but there are still otherss. Since the masks will have no pellicle (they have discovered a material that is transmissive enough), mask defects and mask cleaning are a couple big issues to solve. And right now nobody knows how long the masks will last. (IMEC does have a research program going on finding ways to clean the EUV masks).

JimMcGregor
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EUC is a hard bet
JimMcGregor   7/12/2013 8:23:09 PM
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EUV has been under development since 2006 and most of the foundries do not expect EUV until at least the 7nm generation, one generation beyond the 10nm Intel mentioned. That demonstrates the challenge in bringing this technology to an economic level. However, what really concerns me is now the entire industry is betting on the success of one company ASML/Cymer. I can't remember a time in the history of this industry that so much relied on one technology and one company. And even with EUV, we are likely to hit other physical limits at or just beyond th 5nm limitation. Gordon Moore has predicted the end of his own law three times that I am aware of and the last time was rather recent. He may br right this time around.

resistion
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Not enough time to catch up
resistion   7/12/2013 8:40:01 PM
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This year at SPIE, the troubles with higher doses and higher numerical apertures were pointed out. The more advanced nodes are even harder for EUV to get in. Fortunately it was also revealed 10 nm multi-patterning may not need multiple optical immersion exposures.

Gomez061439
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Still?
Gomez061439   7/15/2013 2:16:21 AM
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Why this guys taking so much time to complete this, they should have done by now...you know once I have seen a guy who done with an <a href="http://www.aiglemed.com/mobility-aid/">Powered wheelchairs</a> project within a week.  

Diogenes53
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EUV
Diogenes53   7/15/2013 11:26:10 AM
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A comment was made above that EUV has been under development since 2006. I suggest readers google SXPL (soft x-ray projection lithography) and find papers in the early 1990s and even late 1980s.  Some marketing guy changed it's name from SXPL to EUV so it would sound more like DUV, but it didnt seem to change the wavelength.  X-ray lithography is just as challenging now as it was then, after huge expenditure of money and manpower. Mr. McGrath's title "a work in progress" is an understatement.  The interesting question is why.  It's not as if alternatives don't exist.

mcgrathdylan
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Re: EUV
mcgrathdylan   7/15/2013 8:06:39 PM
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There are alternatives. Immersion with multiple passes, direct write, and a few other technologies. But other than the multi-pass immersion, my understanding is that all of these other technologeis are also still in development. And each has its own limitations. My understanding from talking with people about this through the years is that most people that are involved in lithography see EUV as the best hope, even though the kidns are still being worked out (and probably will be being worked out for years).

resistion
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Re: EUV
resistion   7/15/2013 9:31:53 PM
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For many years EUV had fixed barriers to overcome, but now that higher resolution is required, EUV has new, harder challenges. Inevitably it will fade away like many other NGL candidates.

mcgrathdylan
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Re: EUV
mcgrathdylan   7/18/2013 8:00:31 PM
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It is just really hard to believe that all of these super smart people, with money and tons of motivation, aren't going to get this into production eventually. ASML has a lot riding on it (as does Intel, TSMC and Samsung). I just think they will eventually get it to where it needs to be. Not to where chipmakers want it to be, but good enough for manufacturing that is economically viable.

resistion
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Re: EUV
resistion   7/18/2013 8:30:11 PM
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That can be said for a lot of technologies not just EUV. But not all make it.

mcgrathdylan
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Re: EUV
mcgrathdylan   7/24/2013 8:45:15 PM
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I agree, and I'm not saying that the progress on EUV has not been painstakingly slow. But it does seem to me that they are getting there, little by little. It's not as much progress as chip makers would like, but it is progress. The source power is increasing.

resistion
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Re: EUV
resistion   7/24/2013 9:13:15 PM
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As long as these encouraging reports on EUV ignore the fundamental issues like shot noise and the impact of higher NA on the multilayer optics, they will give the incorrectly optimistic forecast.

Diogenes53
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Re: EUV
Diogenes53   7/15/2013 10:00:15 PM
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EUV is not the "best hope".  It's strictly political and human emotion, not science.  Too many people have too much invested in SXPL to back off now.  But, ask yourself, if you ordered a PC or a piece of furniture in 2005 for delivery in 2006, and neither was delivered 7 years later, and the vendor still couldn't promise you a delivery date, at what point would you have gone elsewhere?  It is completely irrational to continue to invest in this black hole, but it will continue until it is simply too embarrassing to do so.  Meanwhile, optical, perhaps with a DSA assist and/or imprint will do the heavy lifting.  All the invested SXPL stakeholders will continue to speak of progress and dates just beyond the horizon in the same breath.

mcgrathdylan
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Re: EUV
mcgrathdylan   7/15/2013 10:26:43 PM
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Sounds like you are not a proponent. I understand the frustration. Of course if you ordered a PC or a piece of furniture and hadn't received it after eight years you would have gone elsewhere a long time ago (and demanded your money back). But I would say that's not a perfect analogy. PCs and furniture are pretty established products with many vendors and thousands of choices in each category. This is the creation of an entirely new, complex technology that really does bump up against the fundamental laws of physics. I'm not making excuses for the EUV backers, I'm just saying that I understand that this is very difficult stuff. Perhaps too difficult.

Diogenes53
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Re: EUV
Diogenes53   7/15/2013 10:00:16 PM
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EUV is not the "best hope".  It's strictly political and human emotion, not science.  Too many people have too much invested in SXPL to back off now.  But, ask yourself, if you ordered a PC or a piece of furniture in 2005 for delivery in 2006, and neither was delivered 7 years later, and the vendor still couldn't promise you a delivery date, at what point would you have gone elsewhere?  It is completely irrational to continue to invest in this black hole, but it will continue until it is simply too embarrassing to do so.  Meanwhile, optical, perhaps with a DSA assist and/or imprint will do the heavy lifting.  All the invested SXPL stakeholders will continue to speak of progress and dates just beyond the horizon in the same breath.

rick merritt
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Moore's other law
rick merritt   7/15/2013 7:54:22 PM
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It was about 1997 when I had my one (phone) interview with Gordon Moore.

He predicted at that time that before Moore's Law (i.e. CMOS scaling) ends it would slow down and get harder. He was right. He foresaw what is happening now.

The next decade of advances will come slower at higher costs.

Then...graphene? buckballs? whoknowswhat?

 

Diogenes53
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The Beat Goes On (EUV/SXPL)
Diogenes53   7/15/2013 10:21:30 PM
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The Week In Review: July 15


By Mark LaPedus
There are more problems surfacing with extreme ultraviolet (EUV) lithography. Yes, the light source remains a problem, but the resists appear to be in decent shape. "The next challenge is the mask blank," said Stefan Wurm, director of Sematech's lithography program. The new problem involves ion beam deposition, which apparently is causing defects and overfill on EUV masks, Wurm said. Work is under way to fix the problem.


Henry Berg
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EUV Light Source Alternative: Zplasma Stable DPP
Henry Berg   8/7/2013 6:05:45 PM
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There is an alternative technology for the production of EUV light at lithography power levels. Zplasma Stable DPP uses Sheared Flow Stabilization to stabilize the EUV-emitting plasma. Stable plasma results in light pulses that are 10-100 times longer than than those produced by the unstable plasmas of other sources. The source uses no tin and has a controlled end to each pulse that does not produce the high-energy debris and molten tin sputtering that have been obstacles for other light sources. We have prototyped and demonstrated the physics of Stable DPP in the lab. Zplasma is seeking funding and development partners to scale our prototype up to the 200 watt light source the industry needs.

C3_J2Orange
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superlenses
C3_J2Orange   11/20/2013 4:32:22 PM
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Why super lenses are not considered as an alternative for EUV Lithography. They are not diffraction limited and they can achieve high resolution for 22nm node with conventional UV light source.

C3_J2Orange
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superlenses
C3_J2Orange   11/20/2013 4:32:28 PM
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Why super lenses are not considered as an alternative for EUV Lithography. They are not diffraction limited and they can achieve high resolution for 22nm node with conventional UV light source.

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