LONDON — LETI, the electronics research laboratory that is part of CEA, France's atomic energy commission, has placed another order with Vistec Electron Beam GmbH (Jena, Germany) for a cell projection upgrade of its SB3054 variable-shaped electron beam system, which was delivered at the end of 2007 and installed early this year.
The latest development combines variable-shaped beam technology with the cell projection feature including fast filling cells for process optimization. This offers flexibility with respect to the adaptation of the operation mode to customer-specific application requirements, said CEA (Grenoble, France). The new approach is aimed 45-nm and 32-nm CMOS applications.
"We see the integrated CP functionality as a bridge between the high-resolution requirements of advanced R&D and the challenging throughput expectations driven by industrial prototyping applications," said Wolfgang Dorl, general manager of Vistec Electron Beam, in a statement issued by CEA.
CEA/LETI uses its Vistec SB3054 lithography system for device evaluations and fast prototyping. "The CP upgrade we are developing in collaboration with Vistec on our SB3054 system will constitute a major improvement of this technology. It will allow [us] to significantly speed up the writing time of the devices. A first technology demonstration will be performed on a real pattern in cooperation with our industrial partner STMicroelectronics by Q4 2008," said Olivier Demolliens, head of the nanotech division at CEA/LETI, in the same statement.
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