SAN JOSE, Calif. — An agreement between Duet Technologies Inc. and Numerical Technologies Inc. (Santa Clara, Calif.) brings phase-shift mask (PSM) technology to deep-submicron libraries, possibly alleviating the need for optical proximity-correction (OPC) tools. Duet and Numerical have agreed to develop PSM-enhanced physical libraries with feature sizes at or below 0.25 microns.

OPC software is becoming an important concern because current-generation optical-lithography equipment can produce errors below 0.25 microns. Several vendors are preparing OPC software, but building PSM into a library offers a new option. Either solution is seen as essential for keeping current-generation equipment working at 0.25 microns and below.

Duet and Numerical expect to announce alliances with major IC manufacturing foundries and mask shops to provide a complete solution to their customers.