Design Article
Evolution of manufacturing closure for advanced nodes (Part 2)
Ivailo Nedelchev, Sudhakar Jilla, Mentor Graphics Corp.
2/28/2011 4:51 AM EST
Starting at the 40/45nm design node, DRC/DFM closure emerged as a significant new challenge to IC designers. No longer could manufacturing concerns be effectively handled with the traditional design-then-verify flow. This trend is expected to continue and worsen at the 32nm and 22nm nodes, where manufacturing closure may become a serious bottleneck in design schedules. The reasons behind the growing difficulty of manufacturing closure are explored in part 1 of this series.
The traditional flow, which consists of completing the physical design before performing physical verification checks and DFM improvements, is based on a key assumption—that the place and route tool can get close enough to make physical signoff predictable. In the past, this was a reasonable assumption and the methodology worked. But at sub-40nm it begins to break down as the previous generation routers are not designed to handle the many new and complex DRC/DFM rules.
To access the full Design Article by Mentor Graphics Corp. (in PDF format), click here.
Read also: Evolution of manufacturing closure for advanced nodes (Part 1)
About the authors:
. Ivailo Nedelchev, principal technologist, Place and Route Division, Mentor Graphics Corp.
. Sudhakar Jilla, marketing director, Mentor Graphics Corp.
Courtesy of EE Times India
The traditional flow, which consists of completing the physical design before performing physical verification checks and DFM improvements, is based on a key assumption—that the place and route tool can get close enough to make physical signoff predictable. In the past, this was a reasonable assumption and the methodology worked. But at sub-40nm it begins to break down as the previous generation routers are not designed to handle the many new and complex DRC/DFM rules.
To access the full Design Article by Mentor Graphics Corp. (in PDF format), click here.
Read also: Evolution of manufacturing closure for advanced nodes (Part 1)
About the authors:
. Ivailo Nedelchev, principal technologist, Place and Route Division, Mentor Graphics Corp.
. Sudhakar Jilla, marketing director, Mentor Graphics Corp.
Courtesy of EE Times India
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