SEOUL, South Korea Rivals Samsung Electronics and Hyundai Electronics are embarking on a joint effort to develop sub-0.15-micron lithography techniques.
According to industry sources here, Hyundai and Samsung are working with international semiconductor equipment and materials companies to introduce new lithography gear. The goal is to develop next-generation lithography technology under 0.15 micron.
The lithography strategy is partly intended to help the world's leading DRAM manufacturers maintain their lead over fast-growing Taiwanese rivals. The "gigalevel" IC manufacturing technology is also expected to give the memory makers a foothold in the nonmemory market.
Both companies are either reviewing or actively participating in a handful of international lithography efforts, including Scalpel and an extreme UV program. In the meantime, they are rolling out new equipment needed for 0.15-micron production, including new scanning technology for Hyundai. Exclusive to EE Times by Chom Dan Inc. (Seoul, South Korea).