SAN JOSE, Calif. Cymer Inc. on Thursday (March 31) claimed to have made the world's first shipment of a light source for immersion lithography.
The XLA 200 is said to be the world's first excimer light source engineered for the volume production of semiconductors at the 45-nm node, based on immersion photolithography techniques. It is Cymer's third generation Master Oscillator Power Amplifier (MOPA)-based argon fluoride (ArF) light source.
Operating at a maximum 4-kHz repetition rate and delivering up to 60W of output power, the XLA 200 is designed to provide high numerical aperture (NA), including immersion, imaging capability for advanced 200-mm and 300-mm lithography scanners.
"By offering the highest power and most ultra-narrowed bandwidth as low as (less than or equal to) 0.12pm at full-width half maximum and (less than or equal to) 0.25pm at 95 percent energy integral (E95), the XLA 200 enables exposure of the most critical semiconductor features with near-and, greater-than-unity NA (NA greater than 1.0) lens designs," according to Cymer (San Diego).