SAN JOSE, Calif. Startup Energetiq Technology Inc. has emerged and delieved what it calls a new extreme ultraviolet (EUV) light source for metrology applications to Albany NanoTech.
The new tool, dubbed the EQ-10M, is a 10-Watt light source for use in EUV lithography applications, according to Energetiq (Woburn, Mass.) Founded in March of 2004, the company was stated by former executives of Astex and MKS Instruments.
The EQ-10M will be used for metrology research applications at the UAlbany College of Nanoscale Science and Engineering (CNSE) at Albany NanoTech, a research and development center.
The source is based on Energetiq's Electrodeless Z-pinch technology. The technology is aimed to solve a major problem with EUV.
Traditionally, EUV sources have used a pair of electrodes through which the current is passed. These electrodes can overheat, causing debris that may end up in the optical system.
The EQ-10M employs an electrode-free technology by coupling the current inductively into the discharge plasma. "Using Xenon gas, which is simple to manipulate and non-toxic, the EQ-10M is designed to make a very small plasma producing a bright, high-powered light source," according to the company.
The EQ-10M will be up and running for experimentation by July 2005.
"Energetiq has developed a truly innovative EUV light source that is likely to significantly enhance EUV metrology, making mask inspection faster as well as more reliable and cost-effective," said Gregory Denbeaux, assistant professor of nanoscience at CNSE, in a statement. "This tool will play a significant role in our lithography research program as we move to 13.5-nm lithography."
"With our Electrodeless Z-Pinch technology, we have developed an EUV source that is robust, flexible and cost effective," said Paul Blackborow, CEO of Energetiq, in a statement. "We hope to keep EUV lithography on track to reach high volume manufacturing by the end of the decade."