SAN JOSE, Calif. Seeking to bring extreme ultraviolet (EUV) lithography into chip production, Germany's Xtreme Technologies GmbH claims to have exceeded its target in improving the power output of an EUV light source.
Xtreme claims to have developed an EUV light source at 800 watts of power in a proof-of-principle experiment from about 120 watts at the start of the project. For EUV to work in volume production, the power output must reach approximately 1 kilowatt by around 2010.
EUV lithography is a likely next-generation chip processing technology, based on 13-nm wavelength illumination, allowing chip makers to print features sizes of 32-nm and below on integrated circuits.
Xtreme is a joint venture between Lambda Physik AG and Jenoptik. The shares of Lambda Physik were bought by Ushio Inc. of Japan in 2005.
The venture is part of a European EUV project called More Moore. The 36-month project began in early 2004 and is led by ASML Holding NV of the Netherlands.
EUV is making headways despite a host of technical challenges, including the power output and optics. Carl Zeiss SMT said Wednesday (Dec. 7) that it has shipped the first optical system for an EUV lithography tool to ASML.
ASML (Veldhoven, The Netherlands) is developing two alpha EUV lithography tools for delivery some time in the second quarter with one going to the IMEC research center (Leuven, Belgium) and the other headed to University of Albany nanotechnology campus, New York (see Dec. 7 story).