LONDON Fujitsu is investing Yen 120 billion ($1.05 billion ) in a second 300mm fab in Mie Prefecture, Japan. Volume production on both 90nm and 65nm processes is expected to start in July 2007.
Groundbreaking for the facility is planned for April 2006 and tool install by March 2007. Initial capacity will be 10,000 wafer starts per month by March 2008, with the facility planned to be large enough to make, over time, a maximum of 25,000 wafer starts a month. Fujitsu did not detail when this larger capacity would be achieved.
Fujitsu’s existing 300 mm fab, also in Mie Prefecture is expected to reach 15,000 wafter starts a month by April this year, a year after production began.
Reuters reports a Fujitsu spokeswoman saying the company plans to finance the project with cash at hand and its cash flow, without turning to debt or equity markets.