LONDON Linx Consulting LLC is predicting that demand for pads and slurries will drive the annual market for chemical mechanical polishing (CMP) consumables up 12 percent to $1.23 billion in 2006, up from $1.1 billion in 2005.
Linx (Boston, Mass.) a consultancy founded by Mark Thirsk and Mike Corbett in 2005, said that in 2006 the market for slurries and pads will be about $1.1 billion up from $975 million in 2005. Sales of CMP cleaners and conditioners, which maker up the balance of the market, will be relatively flat, growing from about $125 million in 2005 to about $130 million in 2006, Thirsk, managing partner at Linx said.
In 2005 Rohm and Haas Electronic Materials, with about a 41 percent market share, and Cabot Microelectronics, with 28 percent market share were the largest suppliers in the pad and slurry market.
“Projecting forward, we see the market for slurries and pads utilized in CMP reaching almost $1.8 billion in 2009,” said Thirsk,
Overall the number of CMP operations is increasing at about a 15% compound annual growth rate over the next four years. This year growth will be underpinned by the production at the 130-nm node and continued growth of the 90-nm, whereas in 2008 and 2009 growth will be driven by the ramp of 65-nm device technology.
“Suppliers who have succeeded at 130- and 90-nm processes will continue to realize strong revenues throughout the forecast period,” according to Corbett.
The projections are based on the report “CMP technologies and markets to the 45-nm node” produced by Linx Consulting. As part of the report, Linx provides forecasts for CMP operations by device type and application, detailed perspectives on CMP operations for 90-, 65-, and 45-nm process technologies, the impact of emerging technologies, and an analysis of supplier positioning.