SAN JOSE, Calif. NanoInk Inc. and SII NanoTechnology Inc. (SII) Thursday (June 22) said that they have signed an exclusive licensing agreement to provide "nanoscale" repair solutions to the photomask industry.
The two companies will collaborate on projects that will involve modification of NanoInk's proprietary dip pen nanolithography technology. The technology will be integrated within SII's photomask repair tools, according to SII, a subsidiary of Japan's Seiko Instruments Inc.
The development work will be performed both in the United States and Japan. "With this co-development partnership, SII will bring innovative nanoscale repair solutions to the marketplace in the near future," said Hiroyuki Funamoto, president and chief executive of SII.
SII is one of the leaders in photomask repair. NanoInk (Skokie, Ill.) develops so-called dip pen lithography technology.