SAN FRANCISCO Design-for-manufacturability-(DFM)-focused startup Aprio Technologies Inc. has signed an agreement with the Silicon Integration Initiative (Si2) to contribute lithography process modeling and simulation technology to Si2's Design to Manufacturing Coalition (DTMC), Aprio said Monday (Aug. 28).
The contribution will be used to drive a standards effort for an open data interface specification in the DFM market space, Aprio (Santa Clara, Calif.) said.
Since lithography is unique to a fab's target process, and the data required by each tool in the design flow may be different, several players in the industry have called for an open lithography process interface to ensure that complete and accurate data is passed throughout the entire design flow. By standardizing the interface between IC design creation/analysis tools and lithography modeling and simulation tools, better litho-aware solutions can be quickly added to the IC design and analysis flows, according to Aprio.
By using Si2's OpenAccess standard, Aprio said it was able to establish robust interfaces with DFM partners Ponte Solutions Inc. and Pyxis Technology. A set of "DFM views" are produced by Aprio's Halo-Quest silicon image simulation and analysis tool. Pyxis and Ponte access these views via the OpenAccess interface to enable a new generation of silicon-aware design applications, according to Aprio.
"Aprio has a well-developed interface that is the result of working with many EDA vendors," said Mike Gianfagna, Aprio president and CEO. "By opening up this interface to be part of an industry standard, Aprio believes it can accelerate the proliferation of DFM-aware tools, which will help the industry and the users."
"DTMC is chartered with developing a stronger interface between the EDA and manufacturing worlds," said Steve Schulz, president and CEO of Si2. "We applaud Aprio's foresight in collaborating on this standard."