SAN JOSE, Calif. Crystal IS Inc., a developer of native aluminum nitride (AlN) substrates, has completed a $10.6 million second round of financing.
The investment round was led by Lux Capital, with participation from 3i, Arch Venture Partners, Harris & Harris Group, Credit Suisse (on behalf of the New York State Common Retirement Fund) and Taiwanese Linkmore Ltd.
"This round of funding will allow Crystal IS to ramp production of the 2-in. substrates and reduce prices, enabling cost-efficient high performance UV devices and opening new opportunities in current high volume consumer applications," said Crystal IS CEO Ding Day in a statement.
Crystal IS (Green Island, N.Y.) was founded in the Rensselaer Polytechnic Institute (RPI) incubator program to develop growth technology for native AlN products.
The company previously had raised $5.1 million in 2004. Earlier this year, Crystal IS released the world's first low defect 2-in. native AlN substrates. Competing technologies can only offer small areas of less than 2/3-inch or have a high defect density.
Low defect AlN substrates will enable low cost, high efficiency, high reliability UV optoelectronic products and high power RF components.