SAN JOSE, Calif. Intel Corp. announced that it will invest $1-to-$1.5 billion in its Rio Rancho, N.M.-based site to retool Fab 11X for production on its 45-nm manufacturing process.
Fab 11X will be the company's fourth factory scheduled to use the 45nm process, with production in New Mexico scheduled to start in the second half of next year.
Initial production of Intel's 45-nm products will be done at its Oregon development fab, dubbed D1D. The company is currently building two other factories that will use the 45-nm process. The $3 billion Fab 32 in Chandler, Ariz., will commence production late this year; and the $3.5 billion Fab 28 in Kiryat Gat, Israel, will begin production the first half of next year.
Fab 11X currently manufactures 90-nm computer chips on 300-mm wafers. Fab 11X began production in October 2002 and was Intel's first 300-mm, high-volume manufacturing facility. It was also Intel's first fully automated, high volume factory producing 300-mm wafers.