SAN FRANCISCOA consulting startup called Reticle Labs Wednesday (Dec. 24) unveiled its first software product for mask pattern quantification, to be used in the back-end mask manufacturing environment.
MaskShop, the first in a series of design-for-manufacturing (DFM) tools, is an image processing software for quantifying post and pre-repaired defect patterns found on reticles, according to Reticle Labs (Union City, Calif.). The tool is compatible with the most imaging systems found in a fab, the company said.
MaskShop is capable of quantifying pattern mismatches in pre- and post-repaired defect images to a resolution beyond the pixel size of the imaging system, Reticle Labs said. It is particularly suited for aerial images obtained via a microscope, an inspection system, or simulation software, the company said.
The product can overlay images obtained across different sources and is capable of analyzing features found in double patterning processes, provided the right inputs are available, according to Reticle Labs. The tool was written using .Net technology with specialized image processing algorithms, the company said.
Reticle Labs said MaskShop is now available for evaluation. Pricing information was not provided.