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TSMC tips litho roadmap, backs maskless

TSMC tips litho roadmap, backs maskless
2/27/2009 04:00 PM EST
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Diogenes1111
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re: TSMC tips litho roadmap, backs maskless
Diogenes1111   3/1/2009 3:23:50 PM
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Lastly, that Dr. Lin is not a "fan" of imprint lithography because of defects on 1X masks simply doesn't reflect reality. First, 24nm half pitch masks have been produced on commercial mask tools and processing, enabling 24nm HP a full 4 years ahead ot the ITRS. Secondly, with respect to defects, imprint lithography is where immersion lithography was 2 years ago. The immersion defect problems got solved with more resources. So will the imprint defect problem. What is lost in all this is the incredible low cost of ownership of imprint. In this economy, this is clearly what we need.

Diogenes1111
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re: TSMC tips litho roadmap, backs maskless
Diogenes1111   3/1/2009 3:17:27 PM
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Lithographers around the world owe a debt of gratitude to Dr. Lin for his promotion and support of immersion lithography, a "univeral" solution for all. Sadly, his attempt to ride a second horse into the sunset is badly flawed. Direct write, IF it is a solution to anything, which remains highly questionable, would clearly only be applicable to a very small percentage of IC wafers. To promote this decades old "solution" as universal discredits both Dr. Lin and reasonable advocates of EBDW for prototypes and very small wafer runs.

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