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Lithography's generation gap

4/5/2010 04:00 AM EDT
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re: Lithography's generation gap
resistion   4/5/2010 2:56:10 PM
I found it interesting, that at Intel's 11 nm, they would mix both 193i and an NGL like EUV or maskless, when any of these alone would already pose a lot of cost and complexity. I think a large part of the reason is there are so few nodes left below 20 nm, before other issues (like gate to diffusion contact leakage) begin to dominate the picture. Parts Search

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