PRINCETON, N.J. Sarnoff Corp. said Thursday (June 6) that it has licensed its new IC design technology to Hynix Semiconductor Inc., New Japan Radio, and Toshiba Corp.
The companies have licensed Sarnoff's so-called TakeCharge technology, which substantially reduces the size of IC dies and adds low capacitance figures to RF and communication ICs, according to Sarnoff (Princeton, N.J.).
The company offers three versions of the technology: for 70-nm CMOS; 65-nm CMOS; and 65-nm silicon-on-insulator (SOI), said Koen G. Verhaege, technical director of device design at Sarnoff, and executive director at Sarnoff Europe.
"As current industry attention centers around 90-nm, many of our customers are gearing up to even more advanced technologies, where ultra-thin oxides and mixed supply system-on-a-chip challenges are more stringent but ultimately rewarding in terms of further area gains and I/O speed performance," he said in a statement.
TakeCharge, which also shrinks the chip I/O and electrostatic discharge (ESD) protection area, requires no additional masks or process line changes, the company said.