FREMONT, Calif. -- Mattson Technology Inc., a supplier of chip-making process equipment, and Varian Semiconductor Equipment Associates Inc., a supplier of ion implantation systems, are to collaborate on the development of process technologies for 90-nanometer and more advanced process nodes.
Mattson and Varian have installed one of Mattson's '3000 Plus' rapid thermal processing systems at Varian Semiconductor's Gloucester, Massachusetts facility. The two companies will use the machine to perform ultra-shallow junction formation process development as part of the joint development program.
The companies said they would use the 3000 Plus together with Varian's ion implant capabilities to develop transistor formation technologies for 65-nanometer and smaller device structures. The companies will first focus their efforts on ultra-shallow junction formation. This will be followed by additional activities aimed at furthering the integration of front-end-of-line transistor fabrication processing.