SANTA CLARA, Calif. -- While a consortium has developed the world's first exposure tool based on extreme ultraviolet (EUV) technology, the organization is now looking for ways to boost the critical power output in the system.
The Extreme Ultraviolet LLC consortium yesterday announced the development of an alpha EUV-based tool, but also noted that the system only runs at 10 watts of power (see Feb. 28 story ).
To put the EUV system in a production-worthy fab and achieve decent throughput, the unit must run at two to four times that power specification, said Peter J. Silverman, director of lithography capital equipment at Santa Clara-based Intel Corp.
"There is room for improvement," Silverman said in a presentation at the SPIE Microlithography conference in Santa Clara. "It needs to be in the 50-watt range."
At present, the alpha tool is using a plasma source to drive the power. "I feel confident that we will use an enhanced plasma source in the future," Silverman said in an interview after the presentation. "But there are many other possible types of power sources."
At the SPIE conference, several papers were presented on the subject. For example, in one paper, TRW Space and Electronics Group will describe a way to boost the power output in an EUV tool by using a 750 watt laser-produced plasma (LPP) source.
The method, in which a laser is focused on a target to generate plasma, uses a material called Xenon as the target material. Xenon has also demonstrated EUV emissions of 13-to14-nm wavelengths, the paper said.
In another paper, Cymer Inc. will describe the use of a dense-plasma focus device as a light source for EUV. The paper claims that the company's new dense-plasma focus device is more than sufficient for generating EUV radiation, with the help of Xenon as a source gas.
In a related but separate paper, the Royal Institute of Technology in Sweden describes the use of a Xenon-based liquid-jet laser-plasma source for EUV. Meanwhile, using another type of technology, Lambda Physik GmbH will describe a compact Z-pinch source for EUV tools.
The Sandia National Laboratories will also present a paper that describes the use of an electric capillary discharge source for EUV tools. The paper claims a pulser capable of driving the source up to 1-KHz was possible in preliminary testing. Work is still in progress on this system.