WILSONVILLE, Ore.--Mentor Graphics Corp. here and Taiwan's United Microelectronics Corp. today (Feb. 19) announced a "complete turnkey" design flow for UMC's radio-frequency and mixed-signal CMOS process technologies. The two companies said the package give will UMC's foundry customers a complete solution for new ICs, from product specification to tape-out of designs for volume production.
Mentor and UMC have agreed to work together to offer complete design flows for 0.25-, 0.18-, and 0.13-micron RF CMOS technologies. The quarter-micron design flow is now available, using Mentor's IC Station schematic-driven design environment.
"This will further facilitate RF and analog/mixed-signal designers' ability to devise total, high performance SoC system-on-chip solutions while still bringing products to market quickly," predicted Fu Tai Liou, chief technology officer of UMC in Hsinchu, Taiwan.
The Mentor design kits include UMC-supported Eldo simulation models, Calibre DRC and LVS technology files, schematic symbols, process definition files, and all other configuration files needed to construct a complete design environment, said the two companies.