VELDHOVEN, the Netherlands--ASM Lithography here today announced a major order for multiple 300-mm wafer scanners from Infineon Technologies AG of Munich. The order includes ASML's Twinscan systems for 248-nm krypton fluoride (KrF) and 193-nm argon-fluoride (ArF) exposure tools.
According to the Dutch lithography supplier, the total value of the order worth more than 50 million euros ($42.5 million).
The delivery of the first ASML 300-mm scanners is scheduled for June at Infineon's SC300 300-mm production fab in Dresden, Germany. Two months ago, Infineon said it was ready to begin equipping the 300-mm fab for 256-megabit DRAMs, using 0.14-micron processes. The Dresden production module will cost 1.1 billion euros ($993 million) when it reaches full capacity by the end of 2002 (see April 23 story).
ASML's Twinscan scanner platform is capable of handling both 300- and 200-mm wafers. The systems use Carl Zeiss' Starlith optics and supports multiple generations of optical lithography from i-line to 157-nm tools, according to ASML.
The new order expands ASML's business with Infineon, which has an installed base of the company's PAS 5500 exposure systems in a 200-mm fab in Richmond, Va., said Dave Chavoustie, executive vice president of sales at ASML's U.S. subsidiary in Tempe, Ariz.