LIVERMORE, Calif. -- A U.S.-led consortium that is developing extreme ultraviolet (EUV) lithography tools has received $65 million in additional funding as part of an expanded and new contract for the organization.
The consortium--dubbed Extreme Ultraviolet LLC--has received the new funds from its existing members, bringing the total capitalization for the organization to about $315 million.
The consortium members include six chip makers: Intel, Motorola, Advanced Micro Devices, Micron Technology, Infineon and IBM. It also includes two U.S. national laboratories--Lawrence Livermore and Sandia.
In addition to the funding, the so-called cooperative research and development agreement (CRADA) to develop EUV technology has been extended for another three years.
The contract between the chip makers and the U.S. national labs was set to expire in March of 2002. Now the contract has been extended to 2005, with addition of $65 million in new funds.
"The CRADA extension is a measure of the extent to which the semiconductor industry is committed to making EUV successful," said Jim Glaze, executive director of the Virtual National Laboratory (VNL), in an internal newsletter issued by the Lawrence Livermore National Labs. Based in Livermore, the VNL is the umbrella organization that is in charge of the EUV project.
"While the cost to develop EUVL is high, the payoff to industry and the nation in terms of the computing power that EUVL will enable is potentially immense," he said.
In April, the EUV consortium completed the first full-scale
alpha tool. Expected to hit the market in 2007, the EUV tool is geared for the production of chips at the 70-nm (0.07-micron) and 50-nm (0.05-micron) nodes.