SAN JOSE--Ultratech Stepper Inc. today rolled out mid-field size addition to its 157-nanometer stepper series of lithography tools for R&D applications, such as photoresist and devices characterization.
The new LXS 157 microstepper is equipped with a field size of 4 mm-by-4 mm compared to a smaller 1.5 mm-by-1.5 mm field on a 157-nm tool introduced last year. The small-field system has a fixed numerical aperture and a 10X reduction ratio, while the new mid-field stepper has a high numerical aperture and a 6X reduction ratio, said Ultratech. Both tools are equipped with F2 lasers.
Ultratech is slated to ship its first small-filed 157-nm stepper to an unidentified research consortium in Japan during the second quarter of 2000 (see Nov. 17 story).
"The latest mid-field addition to our 157-nm family is the result of Ultratech's collaboration with its industry-leading customers who are seeking viable high-resolution lithography alternatives as they await the arrival of Lucent Technologies' Scalpel and EUV etreme ultraviolet technologies," said Dan Berry, president and chief operating officer at Ultratech.
Berry said both 157-nm steppers are being offered as R&D tools for development of new resists, reticles, materials, and small devices.