HSINCHU, Taiwan -- Extraction Systems Inc. this week announced an agreement with Hermes Epitek Corp. here to handle sales and service of airborne molecular contaminant filtration and measurement products in Taiwan. These systems are used in deep-ultraviolet lithography systems to control and monitor molecular contaminants in wafer stepper and scanner processes.
Extraction Systems believes Taiwan wafer fabs are now needing to increase their use of these filtration and monitoring systems as chip foundries begin to shrink their leading-edge processes. "With more than 20 years of experience and a client list that includes all of the major Taiwanese semiconductor manufacturers, Hermes Epitek is the ideal business partner on 'Silicon Island,'" said Devon Kinkead, president of Extraction Systems in Franklin, Mass.
The U.S. company said its filtration and monitoring systems are designed to cover a wide range of molecular-based concentrations at different points within the installed based of DUV lithography equipment. Hermes Epitek entered into the sales and service agreement as part of its strategy to become a "full-serve house for semiconductor manufacturing equipment and materials," said Jack Tsai, vice president of the Hsinchu-based company.