TOKYO--Tokyo Electron Ltd. today announced it plans to share a facility with Nikon Corp. to evaluate lithography track coater and developers systems with exposure tools for 300-mm wafer fabs.
The share facility and collaboration will enable TEL to develop new processes and technologies for next-generation fabs, said company officials in Japan. Under an agreement, TEL will install its 300-mm Clean Track ACT 12 system in a cleanroom operated by Nikon in Kumagaya, Japan. The track system will be linked to Nikon's high numerical aperture (NA) krypton fluoride (KrF) scanners for development wo5rk.
In addition Nikon has agreed to install an NSR-S305B scanner in TEL's Koshi plant, which is involved in track coater and developer development. TEL officials said the arrangement is aimed at short-term optimization as well as development through sharing advanced tools and expertise between the two companies.
The sharing of tools and facilities will begin in the fiscal 2001 period, which starts next April.
According to officials, suppliers of photoresist materials will be asked to participate in the cooperative program between Nikon and TEL.