DANVERS, Mass.--Ibis Technology Corp. here today said it has completed an agreement to license silicon-on-insulator (SOI) technology to Mitsubishi Materials Silicon Corp. The licensing pact covers Ibis' standard and Advantox separation by implantation of oxygen SOI (SIMOX-SOI) processes.
Since last year, Ibis and Mitsubishi have been negotiating a comprehensive business arrangement for SIMOX-SIO wafer production and distribution. The agreement sets up a second source of SOI wafers for Ibis customers and allows Mitsubishi to produce the silicon-on-insulator substrates in Japan as well as in certain countries around the Asia Pacific region. Mitsubishi will also sell SIMOX-SOI wafers worldwide under the agreement.
"SIMOX-SOI technology is emerging as a key enabling material to drive the technology roadmaps of several leading integrated circuit manufacturers, particularly for high performance computers and low power communications devices," said Martin Reid, president and CEO of Ibis. "With the adoption of any new technology, access to sufficient supply and multiple sources are critical issues for manufacturers."
Reid said the licensing agreement will establish Mitsubishi as "a viable and reliable additional source for Ibis SIMOX wafers, while also expanding our commercial market."
Mitsubishi Electric Corp. in Japan has also been a user of Ibis SIMOX-SOI wafers for high-performance gate arrays (see May 21, 1997, story). Ibis said it has sold an Ibis 1000 oxygen implant system to Mitsubishi, which will use the equipment to set up manufacturing in Japan.