REHOVOTH, Israel--Expanding its portfolio in process control systems, Nova Measuring Instruments Ltd. here has introduced a new integrated thickness monitoring tool for chemical vapor deposition (CVD).
The NovaScan 840D measures different layers in the CVD process, such as dielectrics, anti-reflective coating, barrier layers, and other thin-film materials. The system supports closed-loop control for reduced process variations, and its real time metrology data helps to minimize "out of spec" losses, said officials at Nova Measuring.
The company built the new CVD metrology system on the same platform as its NovaScan ITM for chemical mechanical planarization (CMP). According to Nova Measuring, the new system has no effect on CVD tool throughput and it requires no extra room on the cleanroom floor. The Israeli company is developing versions of the system for a range of CVD systems for both 200- and 300-mm wafers.
"We have pioneered and introduced the integrated metrology approach to the industry," said Giora Dishon, president and chief executive officer of Nova Measuring. He said the company's experience in the integrated metrology business for CMP systems will help it apply the concept to other processing steps.