TOKYO -- Nikon Corp. has developed three step-and-repeat' scanning photolithography systems, the company said Tuesday (July 8, 2003).
These are: a lens-scanning argon-fluoride excimer stepper for mass production of 80-nanometer minimum dimension devices labeled the NSR-S307E; a lens-scanning krypton-fluoride excimer stepper for mass production of 110-nm devices dubbed the NSR-S207D; and the NSR-SF200, a KrF excimer scan field stepper middle-layer exposure in DRAMs and microprocessors, Nikon said.
Both the NSR-S307E operating at 193-nm wavelength and the NSR-S207D operating at 248-nm wavewlength utilize a newly developed body and are set to be on sale from October 2003, Nikon said.
According to the company the NSR-SF200 is suitable for mass production on 300-mm diameter wafers with 90-nm manufacturing process technology using a mix-and-match with the lens-scanning ArF stepper. The NSR-SF200 goes on sale in November 2003.