ASML Holding NV's schedule to ship an extreme ultraviolet (EUV) lithography tool appears to be a moving target.
In 2002, Intel Corp. ordered the world's first EUV lithography tool, which was supposed to come from ASML of the Netherlands. At the time, Intel said it has ordered a "beta" EUV tool from ASML, which would ship the system to the microprocessor giant in the 2005 timeframe. Intel also plans to take delivery of ASML's first "gamma"--or production-worthy--EUV tool in 2006 (see April 22, 2002 story).
Since that time, however, EUV has been pushed out. Intel hopes to use EUV technology for the 32-nm node by 2009.
And now, Intel and ASML are not commenting when the Dutch-based equipment firm will ship the EUV tool. Peter Silverman, Intel Fellow and director of lithography capital equipment development for the processor giant, this week declined to comment on ASML's EUV shipment date. "You will have to ask ASML," he said.
A spokesman for ASML said the company has not made a commitment in terms of a shipment date.
Based on ASML's track record, the EUV development project has most likely slipped; the company appears to be spending more time and effort in developing immersion lithography tools, according to analysts.