Santa Clara, CA--May 17, 1996--A Precision Implant xRLEAP (Low Energy Advanced Processes) system has been announced by Applied Materials Inc. (Santa Clara, CA). It offers implant performance that will enable advanced device manufacturing well into the next century.
The Precision Implant xR LEAP provides production-worthy implantsfrom less than 1keV to 80keV in a compact housing measuring 2 by4.9 meters (6 by16 feet). By incorporating a patenteddifferential energy reduction technique, the machine achievessubstantially higher beam currents at ultralow energies,resulting in a significant increase in system throughput in the1-10keV range. This advanced capability is critical for thehigh-efficiency fabrication of shallow junctions in 0.25 microndevices, and smaller. During an extended endurance test atultralow energies across a wide dose range, the xR LEAP achievedan aggregate throughput of more than 100 wafers per hour.
Technology of the xR LEAP is also available as a field upgrade tothe older Precision Implant xR80 system, to satisfy futureprocessing needs without re-equipping fabrication plants with newsystems.
Applied Materials Inc.
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