Round Rock, TX--October 25, 1996--DuPont Photomasks Inc.(Round Rock, TX) announced two senior management appointments.
Gilbert V. Shelden has been appointed director of engineering for DPI and will lead technology development at the company's three major North American facilities in Round Rock, TX, Santa Clara, CA, and Kokomo, IN, and technology transfer between DPI sites worldwide. Most recently, Shelden headed photomask development for the research consortium, SEMATECH in Texas. His previous experience includes management and technical positions at IBM's wafer fabrication and photomask facility in Burlington, VT.
Randal W. Chance has joined DPI as a manufacturing technology consultant to DPI's Round Rock production facility, with specific responsibility for the development of advanced photomasks production capabilities. Chance has extensive experience in photomask and semiconductor technology having worked for both Texas Insturments and Mostek. From 1988 to 1991, he was president of Micron Technology.
Chance and Shelden will report to Art W. Launder, executive vice president, DPI America.
DuPont Photomasks Inc.
100 Texas Ave.
Round Rock, TX 78664
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