Sunnyvale, CA--February 18, 1997--The latest version of TMA WorkBench, available now, includes among its new features an integration with DFM WorkBench, the ability to apply a technology process to multiple layout cross sections simultaneously to form a complex semiconductor device or circuit, and a powerful Response Surface Methodology (RSM) module.
Version 2.2 of TMA WorkBench, an IC technology design environment, is tightly integrated with TMA's DFM WorkBench. DFM WorkBench is a TMA product that addresses design for manufacturability (DFM). The integration of TMA WorkBench and DFM WorkBench allows users to input the optimized baseline flow for Monte Carlo sampling. Full compatibility of the file storage formats ensures smooth exchange of information between these two products.
TMA WorkBench provides complete control of complex device and circuit simulations, from mask selection to device characterization, allowing simulation of multiple devices, such as CMOS pairs, in one simulation flow. Users can specify the cutline locations of the devices in TMA Layout, and the mask information is used in the process simulation flow to generate various device structures.
The redesigned RSM module enables design engineers to easily communicate to fab engineers expert knowledge of the analytical models from process outputs. The RSM module has a well-defined strategy of model building, the ability to choose polynomial models of an arbitrary order, interactive and histogram plotting capability, an increased set of scalar and vector model fit measures, outlier data point suppression, and non-linear response transformations.
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