Santa Clara, CA--April 25, 1997--Canon U.S.A. Inc.'s Semiconductor Equipment Division (Santa Clara, CA) has added a new KrF excimer laser stepper to its growing line of microlithography products that deliver precise control at high speeds. In announcing the FPA-3000EX4, Canon noted an increase in throughput of nearly 30 percent, compared with the EX3 model that was successfully introduced last year.
Equipped with the Cymer 1 kHz KrF laser, the FPA-3000EX4 can exceed 73 wafers per hour, exposing 0.25m images with 35nm stage stepping accuracy. Features of the new stepper include a fast linear motor air-guided tilting (FLAT) stage for higher throughput and alignment accuracy, the CQUEST II off-axis illumination mode for better depth-of-focus, and an optimized tilt focusing system (CCD-OPTF II) for improved edge-shot chip yields and focus reliability. With the EX4, users can select from the full range 0.40 to 0.60 variable numeric aperture (NA).
Canon will introduce the FPA-3000EX4 at the SEMICON Europa '97 exhibition in Geneva, Switzerland, April 15-17. The company has scheduled delivery of its newest KrF stepper beginning July 1997.
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