Santa Clara, CA--April 25, 1997--Applied Materials Inc. (Santa Clara, CA) has delivered an RTP Centura to Philips Research in Eindhoven, the Netherlands. The RTP system will be used for advanced 0.25 m and beyond process development that will ultimately be transitioned to Philips' semiconductor manufacturing sites.
The RTP Centura was specifically designed to enable users to precisely measure and control wafer temperature. The system's patented Honeycomb Source has multiple heating zones, each of which is adjusted 20 times per second using data collected from several temperature sensors positioned below the backside of the wafer. The RTP Centura's exclusive Emissometer enables accurate wafer temperature measurement regardless of variations in wafer backside emissivity due to varying film composition.
Santa Clara, CA
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