Minneapolis, Minn.--Dec. 22, 1997--FSI International, Inc. has received repeat orders totaling $9.6 million for its Polaris 2200 MicrolithographyClusters from a U.S.-based semiconductor manufacturing company. The equipment, which will be used in the customer's new 8-inch fab for high-throughput i-line applications for i-line applications, will ship during calendar year 1998.
The Polaris 2200 Microlitography Cluster is an advanced photoresist processing system that provides system flexibility,high throughput, and other performance advantages. The Polaris2200 Cluster consists of independent modules arranged around acleanroom robot. Each module is totally independent and requiresno mechanical interface. This methodology, coupled with advancedsoftware and process technology, makes the Polaris 2200 Clusterwell-suited for 0.25-(m semiconductor manufacturing.
The FSI Microlithography Division supplies photoresist processing equipment and services that meet the full range of needs for the semiconductor, flat panel display, thin-film head, and multichip module markets. The division, with its subsidiary, Semiconductor Systems Inc. (SSI), manufactures the Polaris Microlithography Clusters for advanced i-line and DUV processing, and the Orbitrak, Scorpio, and Apex Microlithography Clusters.
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