San Jose--July 29, 1999--Atmel Corp. (San Jose)announced that it has placed multiple unit orders from ASM Lithography (ASML; Veldhoven, The Netherlands) for both its latest DUV and I-line Step &Scan photolithography equipment.
"Atmel plans to fully convert the Rousset Fab in France from current 0.25-µm production capacityto more advanced step & scan production capacity at 0.18-µm and below. Atmel will add enough0.18-µm capacity to fabricate approximately 20,000 eight-inch wafers per month by the end of 2000," said T.C. Wu, Atmel's executive vice president of Technology.
Some of the equipment in these orders has already been shipped and installed in Atmel's Rousset fab.
ASML's PAS 5500 family of Step & Scan systems selected include both DUV and I-line, specified for0.18-µm and 0.28-µm resolutions respectively. All systems are high-productivity tools, each capable of processing more than 104 200-mm wafers per hour and designed to achieve cost-effective,mix-and-match lithography solutions.
San Jose, CA
Return to Headlines