Langen, Germany and Migdal Haemek, Israel -- February 28, 2001 -- Nikon Corp., a provider of semiconductor optical manufacturing equipment, and Tower Semiconductor Ltd., a specialized wafer foundry, announced today that Tower has selected Nikon's DUV scanner systems and i-line steppers for its new manufacturing facility Fab 2.
Initially Nikon will supply Tower by July 2001 with two systems NSR-2205i14E2 i-line stepper and NSR-S204B scanner system for Tower's 0.18-micron pilot line. As Tower ramps-up capacity in Fab 2 in the second half 2002, Nikon will provide it with models NSR-S205C scanning steppers and NSR-2205i14E2 i-line steppers and/or NSR-SF110 wide-field steppers. The total value of the agreement is expected to reach or exceed $150 million over the next four years.
"In our assessment and negotiation process, Nikon's exposure systems presented the best overall value," said Ron Niv, Fab 2 manager in Tower. "We have been happy with Nikon's support over the years, and are relying on their consistent quality and responsiveness to contribute to Fab 2 success."
Kimio Shioiri, president of Nikon Precision Europe, stated: "Nikon will continue to support Tower and its new technologies in the future, as there has been a stable and good relationship over the past 10 years already. Nikon's existing local Israeli support will persist to give their utmost to assure the success of Tower's new project."
Tower recently began construction of an advanced fab adjacent to its current facility in Migdal Haemek, Israel. The new fab, referred to as "Fab 2," will employ approximately 1,000 employees and produce up to 33,000 200-mm wafers per month in geometries of 0.18 micron and below, using advanced CMOS technology from Toshiba. Funding for the project is being provided mainly by wafer partners, Israel Corp, an Israeli government grant, bank loans and Tower's own resources.
For more information contact: Tower Semiconductor
Migdal Haemek, Israel
Nikon Precision Europe GmbHr