LONDON The College of Nanoscale Science and Engineering at the University of Albany, New York, has issued a statement that it stands by its announcement that it received the world's first full-field R&D EUV tool from ASML Holding NV.
In the statement the College of Nanoscale Science and Engineering (CSNE) also offered help to European research institute IMEC as it assembles another ASML EUV lithography machine and gets it up and running.
CSNE made an original announcement that it had received the world's first EUV alpha tool on
Monday (Aug. 28). This was followed on Tuesday (Aug. 29) by IMEC (Leuven, Belgium) claiming it had started the installation of the world's first EUV tool. IMEC said in a press release that it received its system from ASML (Veldhoven, The Netherlands) at
7:00am on Aug. 16.
A spokesman for (CSNE) declined to say when the college took delivery of its EUV tool but said the college's claim was based on the fact that its machine had been working at ASML prior to delivery, and was therefore the first EUV tool.
A statement attributed to James Ryan, Professor of Nanoscience and vice president of technology, at University of Albany College of Nanoscale Science and Engineering, and sent by email to EE Times said: "The College of Nanoscale Science and Engineering (CNSE) of the University at Albany stands by its announcement that it has received the world's first full-field R&D EUV tool from ASML. The tool was fully qualified and operational on-site at ASML before shipment to CNSE and has produced the world's first full-field EUVL exposed images, which were reported by ASML at a number of conferences and workshops. We wish our colleagues at IMEC luck and offer our help as they get their tools assembled and up and running to the specifications set by CNSE's EUVL tool, and we are confident that with ASML's state-of-the-art know-how and support, IMEC will be successful at reaching milestones similar to those we have already achieved. We also look forward to working with our industry partners and ASML to make EUV a manufacturing reality."