CAMBRIDGE, UK Olympus has introduced the MPLAPON series of plan apochromatic objectives available in 50x and 100x magnification, providing the ultimate level of chromatic aberration correction for materials imaging.
Developed to provide excellent bright-field imaging, including DIC, the MPLAPON objectives feature numerical apertures (N.A) of 0.95 and are fully compatible with active auto-focusing units.
As a result, highly resolved images can be obtained easily, making the MPLAPON series well suited for inspecting minute areas in industrial imaging samples, such as semiconductor patterns.
The very high resolution capabilities of the MPLAPON objectives enable individual imaging and observation of points separated by only 0.35micron.
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