Breaking News
News & Analysis

Samsung, TSMC hit by ITC complaint

6/28/2010 10:20 PM EDT
3 comments
NO RATINGS
More Related Links
View Comments: Newest First | Oldest First | Threaded View
resistion
User Rank
CEO
re: Samsung, TSMC hit by ITC complaint
resistion   6/27/2010 6:17:57 AM
NO RATINGS
Some more information from the ITC blog. The allegation against TSMC is that they used double patterning with two coatings of photoresist in their 28 nm product. However, I think STC jumped the gun. The gate pitch reported at IEDM does not warrant double patterning. STC is thinking about logic's low 2X nm node, so everyone beware! The allegation against Samsung is based on its 3X nm Flash, but NAND Flash probably would not use STC's process.

resistion
User Rank
CEO
re: Samsung, TSMC hit by ITC complaint
resistion   6/25/2010 2:33:25 AM
NO RATINGS
I'd think Samsung and TSMC use the same photoresists and techniques as other companies like Intel, IBM, Toshiba, NEC, etc.

Flash Poll
Radio
LATEST ARCHIVED BROADCAST
EE Times editor Junko Yoshida grills two executives --Rick Walker, senior product marketing manager for IoT and home automation for CSR, and Jim Reich, CTO and co-founder at Palatehome.
Like Us on Facebook

Datasheets.com Parts Search

185 million searchable parts
(please enter a part number or hit search to begin)
EE Times on Twitter
EE Times Twitter Feed
Top Comments of the Week