LONDON – Sokudo Co. Ltd., a coating and track process equipment company, has announced it will join the Imagine research program based at CEA-Leti that is developing maskless lithography for IC manufacturing at 22-nm and beyond.
The three-year project is led by CEA-Leti (Grenoble, France) and is evaluating the use of a multi-beam e-beam machine from Mapper Lithography BV (Delft, The Netherlands). It includes chip manufacturers Taiwan Semiconductor Manufacturing Co. Ltd. and STMicroelectronics. The multiple e-beam-lithography program covers tool assessment, patterning and process integration, data handling, prototyping and cost analysis.
Sokudo (Kyoto, Japan) is a joint venture company owned by Dainippon Screen Mfg. Co. Ltd. and Applied Materials Inc. in 2006.
"E-beam has the potential to be a viable technology for many sub-22-nm lithography process layers in logic/foundry semiconductor manufacturing," said Tadahiro Suhara, president and CEO of Sokudo, in a statement issued by CEA-Leti. "Sokudo is taking a comprehensive approach to being prepared for coat/develop track process readiness in multiple sub-22nm lithography technologies, including immersion ArF lithography extensions, EUV and e-beam lithography.
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