SAN JOSE, Calif. - Intel Corp. is expected to spend some $1.5 billion for lithography gear alone in 2011, according to an analyst.
Japan's Nikon Corp. was Intel's sole leading-edge lithography vendor for the 32-nm node. As expected, Nikon and rival ASML Holding NV will share the lithography business for the 22-nm node, according to Barclays Capital.
''We expect Intel will spend flattish capex of $5.2 billion in 2011,'' said C.J. Muse, an analyst with the firm, in a report. ''Our checks on the litho front point to Intel ordering 27 immersion tools and 15 KrF tools in 2011. Assuming new coater-developer tools are attached and assumptions around ASML/Nikon share splits and ASPs, we derive a total litho budget from Intel of $1.5 billion.''
In comparison, Intel is expected to procure 26 193-nm immersion tools in 2010, according to the firm. Some 18 of those are from Nikon and the remaining 8 tools come from ASML. Intel's total litho budget is about $988 million, according to the firm.
In 2011, Intel is expected to buy 27 193-nm immersion tools, including 15 from ASML and 12 from Nikon, according to the firm.
Good to read about some spending from the big companies in my area of work. I can safely assume that there will be lot of new jobs coming from ASML and that's pretty nice for new engineers and professionals like me.
I assume you meant that sarcastically.
None of the money goes to US companies. (apparently once again, we have become total losers in a technology that for the most part, started here.) Plus who nows where this equipment is going: US or China?
Immersion lithography is used because the index of refraction of water is higher than that of air, and that property is used to create finer details on the wafer than is possible by using the same wavelength light in air. KrF refers to the gas used in the exposure lamp to create a monochromatic light source. Any litho guys out there can correct any errors I may have made.
The immersion tools are lithography tools which use 193 nm wavelength and immerse the exposed part of the wafer under water. ASML uses the same drop of water blown over the wafer, while Nikon flows water under the lens and sucks it back up. Only Nikon immersion tools are used for Intel's 32 nm critical layers. They are said to be cheaper possibly because of smaller footprint.
The KrF tools use a longer wavelength (248 nm) and could be used for the looser layers, like the higher Cu damacene layers. Their resolution is not so strong as immersion but it is sufficient plus they offer the better depth of focus.
There is no doubt now that intel will skip 28nm, inspite focusing on smaller size. Besides why to give big share to Nikon who has problems with ultra litho where ASML is in good shape. At this point Nikon's efforts would change the score of the game
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