SAN JOSE, Calif. - CEA-Leti and a spinoff, Aselta Nanographics, are creating a joint lab to develop e-beam proximity effects correction solutions for both mask writing and maskless lithography applications.
This common lab is staffed with a joint team of CEA-Leti and Aselta personnel. Part of this collaboration will be done inside the multi-partner Imagine program, which is designed to develop maskless lithography for IC manufacturing.
Launched in November 2009, Grenoble, Franch-based Aselta develops software that reduces production costs for chips at the 32-nm node and beyond by improving fab-process precision, including cycle time and lithography-image quality.
“Launching and supporting startups in one of our main missions and Aselta is one of the most promising companies to come out of Leti. It is addressing key maskmaking challenges for both critical dimension (CD) control and writing speed,” said Serge Tedesco, CEA-Leti program manager, in a statement. “Moreover, the growing interest in ML2 has to be supported from the point of view of proximity-effect correction and CEA-Leti, with its industrial Imagine program, will provide the right environment.”
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