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Startup rolls complementary litho

2/28/2011 06:18 AM EST
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wilber_xbox
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re: Startup rolls complementary litho
wilber_xbox   3/3/2011 8:40:16 AM
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You are true in saying that it will be the best if maskless can avoid being complementary to optical. But as Intel has proposed to go from 2D-design to 1D design at smaller nodes, complementary to optical lithography becomes more cost effective. Maskless lithography technologies will be easier to implement even with lower e-beam dose (or throughput). Going to smaller nodes solely based on optical will be a nightmare.

resistion
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re: Startup rolls complementary litho
resistion   3/2/2011 3:34:17 PM
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Since we're talking complementary, best to minimize extra exposures and technologies. Can maskless avoid complementary and be sole exposure? That should be their goal.

wilber_xbox
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re: Startup rolls complementary litho
wilber_xbox   3/2/2011 2:22:25 PM
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@resistion, why do you think so? As far as i know, the cost becomes quite an issue at smaller nodes than 22nm.

wilber_xbox
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re: Startup rolls complementary litho
wilber_xbox   3/2/2011 2:21:08 PM
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@Mark, even with 100 columns and 26nA current per column, Multibeam's throughput will be atleast 50 times smaller that that of Mapper, which is also developing multiple e-beam lithography tool. Has multibeam shown any exposures results from their tool? Why multibeam thinks that they have right formula and others not?

resistion
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re: Startup rolls complementary litho
resistion   2/28/2011 2:51:55 PM
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If all the cuts can be put on one 193i mask, that will still be best. Even two 193i masks might be tolerated.

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