SAN JOSE, Calif. – ASML Holding NV is just barely shipping its first pre-production extreme ultraviolet (EUV) lithography tool, based on a 13.5-nm wavelength technology.
Rival Nikon Corp. is working on similar EUV tools. But according to Nikon, the industry is now in discussions about the development of EUV, based on a 6.7-nm wavelength technology.
EUV based on 13.5-nm technology is late and could miss the market window. Some think it’s a one- or two-node solution.
So, there is a school of thought that EUV based on a 6.7-nm wavelength is more feasible solution. But like 13.5-nm EUV, 6.7-nm technology faces many of the same hurdles: power source, multi-layer coatings, metrology among others.
EUV based on 6.7-nm wavelength is an interesting concept, but the industry hasn’t even ''conquered'' 13.5-nm technology, observed Burn Lin, senior director of the Nano Patterning Division at Taiwan Semiconductor Manufacturing Co. Ltd.
So, long waited respond of Nikon at EUV is 6.7, thats good however where they stand at this moment. Still lots of rumors related to bad luck of nikon at EUV. Also any information about applied's plans for EUV?
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