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SPIE: EUV sources behind schedule

2/28/2011 11:36 PM EST
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anon2498163
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re: SPIE: EUV sources behind schedule
anon2498163   3/1/2011 10:31:12 PM
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Why not build your critical layer litho fab near an existing beam line. If you attenuate the beam to feed multiple tools and reduce the power, you can distribute the cost and prevent reticle damage.

any1
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re: SPIE: EUV sources behind schedule
any1   3/1/2011 4:29:46 PM
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The power sources for EUV are late, the reticle technology is lacking, the resists are not ready yet, and some estimates put the cost of the first production tools at well over $100 million each. In addition both the sources and the tools themselves are currently massive in size compared to 193 nm immersion tools. I believe that currently EUV litho would be even more expensive than quadruple patterning, let alone double.

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