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Imprint litho makes a good impression

3/3/2011 00:50 AM EST
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BobbieSmith
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re: Imprint litho makes a good impression
BobbieSmith   3/4/2011 5:40:06 PM
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Tools that can inspect templates down to 24nm exist today. Yes, they are slow and based on ebeam, but they work. Unlike EUV where we have pinned all our hopes on a currently fictitious 100W xray source.

resistion
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re: Imprint litho makes a good impression
resistion   3/4/2011 4:44:58 PM
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No one has brought up the issue of template inspection.

Diogenes53
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re: Imprint litho makes a good impression
Diogenes53   3/4/2011 4:22:49 PM
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Molecular Imprints produces both large area and step and repeat tools. There is no such thing as "full wafer imprint" for semiconductor applications because of registration. MI has the only semiconductor imprint tool and has also sold numerous large area imprint tools to disk drive produces for bit patterned media.

double-o-nothing
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re: Imprint litho makes a good impression
double-o-nothing   3/4/2011 3:36:57 AM
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They are totally different. Obducat is full-wafer imprint, MII is step-and-imprint.

resistion
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re: Imprint litho makes a good impression
resistion   3/3/2011 2:08:33 AM
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Obducat is also popular for imprint. Are the technologies for Obducat and MII compatible for defining standards?

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