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KLA joins Sematech's EUV research program

6/22/2011 06:53 PM EDT
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resistion
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re: KLA joins Sematech's EUV research program
resistion   6/22/2011 7:26:10 PM
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Nikkei reports Japan-based consortium focused on EUV by 2015. Meanwhile, Intel already scheduling 7 nm Pelican Lake in 2016, which leaves no time for dotting all the i's. It's a wrap.

mcgrathdylan
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re: KLA joins Sematech's EUV research program
mcgrathdylan   6/22/2011 10:58:22 PM
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A wrap as in going into production as is? My understanding is that there are still some significant issues with EUV, including the lack of an EUV pellicle as well as questions about the power sources and other issues.

resistion
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re: KLA joins Sematech's EUV research program
resistion   6/23/2011 8:44:13 AM
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I mean wrap as in close it, for the reasons you stated, given the timing inconsistency. Intel and Samsung were included in the Nikkei news, and they are the main drivers, but it's not consistent with their schedule.

resistion
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re: KLA joins Sematech's EUV research program
resistion   6/23/2011 2:36:41 PM
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Here is the Nikkei link: http://e.nikkei.com/e/fr/tnks/Nni20110617D17JFN05.htm

goafrit
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re: KLA joins Sematech's EUV research program
goafrit   6/23/2011 12:18:42 AM
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This is how to do it. Get the pool and do some real useful things. This is good. I think they will have value in this strategy

nicolas.mokhoff
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re: KLA joins Sematech's EUV research program
nicolas.mokhoff   6/23/2011 3:13:05 PM
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CNSE is precisely available to try out the next generation lithography choices. It is a research environment might not be practical for years. But ti does two things: research to find alternatives to hurdles seen today, and teaching next-generation litho guys the ropes of the trade. Sometimes our patience fuse is too short as far as litho progress is concerned. KLA's a important metrology player in the next-gen equation: if you can't measure it, you can't build it.

wilber_xbox
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re: KLA joins Sematech's EUV research program
wilber_xbox   6/24/2011 5:31:42 PM
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Isn't it late for KLA to join in especially when the plans to introduce EUV is by 2012-2013? There would be significant metrology challenges and i am not sure whether the development of metrology for optical can be used for other litho tools.

resistion
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CEO
re: KLA joins Sematech's EUV research program
resistion   6/27/2011 2:20:54 PM
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Working in EUV requires strong denial skills.

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