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EUV litho source is much brighter, says Ushio

10/31/2011 11:54 AM EDT
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adelestuart
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re: EUV litho source is much brighter, says Ushio
adelestuart   6/20/2013 10:18:43 AM
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if they say so then is a good thing. http://www.yachtbooker.de/Yachtcharter-murter.html

resistion
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re: EUV litho source is much brighter, says Ushio
resistion   5/13/2013 4:37:56 PM
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Just read Ushio no longer supporting this activity. I think they saw the writing on the wall. http://www.businesswire.com/news/home/20130509005460/en/USHIO-Consolidate-EUV-Business-Single-Unit-Japan

resistion
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re: EUV litho source is much brighter, says Ushio
resistion   11/9/2011 7:09:39 AM
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If EUV's first node already requires double patterning, its third node will require quadruple.

double-o-nothing
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re: EUV litho source is much brighter, says Ushio
double-o-nothing   11/9/2011 5:24:31 AM
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If EUV is going to require double patterning, as has been suggested for the NXE 3300, the throughput is never going to catch up, and the cost effectiveness justification is gone.

resistion
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re: EUV litho source is much brighter, says Ushio
resistion   10/31/2011 3:01:53 PM
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"output equivalent" is not same as actual output. And the intermediate focus power has to increase to keep the same throughput for smaller features. It is not a fixed 100 W target. EUV production is such a highly inefficient process, the very opposite of green. So much energy going in, only for low efficiency production of radiation at many wavelengths over a broad range, all of which (except one) are then re-absorbed (i.e., wasted). At least excimer lasers produce a very narrow wavelength range.

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